OMOS M Series
Designed by researchers for researchers.
OMOS M series analytical metallographic systems make perfect solutions for the microstructure of materials automatic analysis. When you image and analyze samples, you are often faced with complex and interrupted processes that can make tasks take much longer than you want them to. OMOS M series microscopes have vast experience in bringing together optical precision, automation, analytical power, and data management via the workflow-oriented system. The new M series analytical metallographic system product range takes this one step further, offering peerless flexibility and ease of use that can make any task a controlled workflow.
Ostec is dedicated to ensuring that the best solutions are available for your work, from microscopes and digital cameras to software and data storage. OMOS M series microscopes bring all of our experience to you, giving you control over every aspect of your hardware, workflow, measurements and data management. Our mission is your success both now and in the future. Only three components for the complete solution.
Hardware – Digital Camera
Digital CCD color camera for speedy pixel-by-pixel image stitching provides fast video image obtainment. Stitch your field of view manually without using motorized stages and z-modules.
Extremely low-cost solution, incredibly quick and genuinely excellent result.
2048 X 2048
Creating an efficient workflow requires careful definition of the tasks and tools at each stage. With the OMOS Software platform’s dynamic GUI the same is true – the tools you need for each stage are clearly available, without clutter or the need to search.
It is your workflow, so with OMOS Software you can have it your way. Within each layout you can specify how many tools and controls are shown on screen, eliminating unnecessary controls and placing the ones frequently used exactly where you want to have them. Our expertise is in your hands. Ostec has brought its imaging and analysis expertise directly to you via the unique workflow management concept. This idea guides you easy, step by step through tasks such as multiple image alignment, phase analysis, report generation, as well as complex processes utilizing our microscopes.
The workflow management concept ensures there are no mistakes, just reproducible results. Integration with Microsoft Windows and Microsoft Office software programs, rather than reinventing key processes. As a result you will feel “at home” using OMOS Software, even for complex processes such as complex calculations and statistics, which are completed directly in Excel, or for report template generation in Word.
Modular structure of the software allows to perform image analysis for different market sectors: metallurgy, machine building, mining, chemical, nuclear industry, microelectronics and research institutes in various software and hardware systems, to study samples microstructures for compliance with different standards (GOST, ISO, ASTM, DIN, internal company standards, etc.).
Software additional modules:
- OMOS Base – basic version of the software
- OMOS Castiron Module – cast iron control
- OMOS Steel Module – steel and alloy samples control
- OMOS Biomedicine Module – biomedicine control
- OMOS Microelectronics control
OMOS Software includes metallographic methods for steel, non-ferrous metals and alloys analysis:
- Grain size in steels and alloys;
- Non-metallic inclusions in steels and alloys;
- Graphite in cast iron analysis;
- Relative ferrite and perlite content;
- Martensite needles length measurements;
- Intergranular corrosion analysis;
- Methods of comparison with standards, etc.
Ostec is proud to create a unique method of analysis for its every customer.
Modules for automated analysis of rocks, ores, products of enrichment and reprocessing, cement clinker; kern. Automatic quantitative measurement of mineral composition, particle size distribution, ore components and ore concentrates disclosure degree to classify the main components with the classes list release (quartz, feldspar; muscovite, biotite, rock fragments, carbonate cement, etc.).
Semiconductor wafers control and metrology, geometric measurements to create a panoramic image with the increased depth of focus and the application of annotations.
Automated histological, cytological, dermatological research.